説明
説明なし構成
構成なしOEMモデルの説明
The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.ドキュメント
ドキュメントなし
SCREEN / DNS / DAINIPPON SCREEN
FC-3000
検証済み
カテゴリ
Wet processing
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
98798
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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すべて表示
SCREEN / DNS / DAINIPPON SCREEN
FC-3000
検証済み
カテゴリ
Wet processing
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
98798
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.ドキュメント
ドキュメントなし