説明
説明なし構成
構成なしOEMモデルの説明
The ASML AT 1100 is a Steppers and Scanners system. The AT 1100 has Scanner 12". AT:1100 is a 193 nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). Build upon ASML's successful 300 mm TWINSCAN dual-stage platform introduced in July 2000. The AT:1100 achieves a throughput of 93 wafers-per-hour at a dose of 20 mJ/cm2. By separating the align and expose operations, more extensive and accurate alignment and wafer surface height mapping of the entire 300 mm wafer can be performed without impacting throughput. This increase in metrology accuracy is essential for delivering the 100 nm critical dimension control and less than 20 nm overlay across the wafer at full throughput. The AT:1100 introduces new 4 kHz ArF laser technology which contribute to its leading productivity advantage. The AT:1100 is designed for seamless mix-and-match operation with ASML's TWINSCAN product family.ドキュメント
ドキュメントなし
ASML
TWINSCAN AT:1100
検証済み
カテゴリ
193 nm Step and Scan
最終検証： 29日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
102934
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN AT:1100
カテゴリ
193 nm Step and Scan
最終検証： 29日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
102934
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The ASML AT 1100 is a Steppers and Scanners system. The AT 1100 has Scanner 12". AT:1100 is a 193 nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). Build upon ASML's successful 300 mm TWINSCAN dual-stage platform introduced in July 2000. The AT:1100 achieves a throughput of 93 wafers-per-hour at a dose of 20 mJ/cm2. By separating the align and expose operations, more extensive and accurate alignment and wafer surface height mapping of the entire 300 mm wafer can be performed without impacting throughput. This increase in metrology accuracy is essential for delivering the 100 nm critical dimension control and less than 20 nm overlay across the wafer at full throughput. The AT:1100 introduces new 4 kHz ArF laser technology which contribute to its leading productivity advantage. The AT:1100 is designed for seamless mix-and-match operation with ASML's TWINSCAN product family.ドキュメント
ドキュメントなし