説明
説明なし構成
構成なしOEMモデルの説明
The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.ドキュメント
ドキュメントなし
ASML
TWINSCAN XT:1700Fi
検証済み
カテゴリ
193 nm Step and Scan
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
100682
ウェーハサイズ：
不明
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1700Fi
カテゴリ
193 nm Step and Scan
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
100682
ウェーハサイズ：
不明
ヴィンテージ：
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.ドキュメント
ドキュメントなし