説明
説明なし構成
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEMモデルの説明
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.ドキュメント
ドキュメントなし
KLA
8100
検証済み
カテゴリ
CD-SEM
最終検証： 9日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
117149
ウェーハサイズ：
不明
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KLA
8100
カテゴリ
CD-SEM
最終検証： 9日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
117149
ウェーハサイズ：
不明
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEMモデルの説明
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.ドキュメント
ドキュメントなし