説明
説明なし構成
構成なしOEMモデルの説明
Lam developed the Teres CMP integrated polishing and cleaning system based on a technological approach different from that of conventional polishers which utilize a rotating table and rotating polishing heads. Lam has developed a proprietary linear polishing method and has designed its polishing system to be installed in a Class 1 cleanroom environment to planarize patterned films on wafers, and to polish wafers at higher rates and achieve the uniformity and planarity that is necessary to manufacture advanced semiconductor devices.ドキュメント
ドキュメントなし
カテゴリ
CMP
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
141201
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
TERES
カテゴリ
CMP
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
141201
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
Lam developed the Teres CMP integrated polishing and cleaning system based on a technological approach different from that of conventional polishers which utilize a rotating table and rotating polishing heads. Lam has developed a proprietary linear polishing method and has designed its polishing system to be installed in a Class 1 cleanroom environment to planarize patterned films on wafers, and to polish wafers at higher rates and achieve the uniformity and planarity that is necessary to manufacture advanced semiconductor devices.ドキュメント
ドキュメントなし