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TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
  • TEL / TOKYO ELECTRON ACT 12
説明
Multi Block (Resist Coater/Developer)
構成
構成なし
OEMモデルの説明
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.
ドキュメント

ドキュメントなし

カテゴリ
Coaters & Developers

最終検証: 13日前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

109167


ウェーハサイズ:

12"/300mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示

TEL / TOKYO ELECTRON

ACT 12

verified-listing-icon
検証済み
カテゴリ
Coaters & Developers
最終検証: 13日前
listing-photo-a43a219382ea4ed79ce6882210d18364-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

109167


ウェーハサイズ:

12"/300mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Multi Block (Resist Coater/Developer)
構成
構成なし
OEMモデルの説明
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.
ドキュメント

ドキュメントなし

同様のリスト
すべて表示