説明
1.Inline: Nikon in-line 2.Pump: RRC 8 One 3.Main Controller：Type3 4.Spin Motor type: Panasonic 5.Chemical supplier: ADH local Solvents/Dev CSS 6.T/H controller：2 tower model：ME2構成
PN: MD-E220490/MD-E220494OEMモデルの説明
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
ACT 12
検証済み
カテゴリ
Coaters & Developers
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
114303
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
ACT 12
カテゴリ
Coaters & Developers
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
114303
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
1.Inline: Nikon in-line 2.Pump: RRC 8 One 3.Main Controller：Type3 4.Spin Motor type: Panasonic 5.Chemical supplier: ADH local Solvents/Dev CSS 6.T/H controller：2 tower model：ME2構成
PN: MD-E220490/MD-E220494OEMモデルの説明
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.ドキュメント
ドキュメントなし