説明

Multi Block (Resist Coater/Developer)

構成

Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS Pro Z-i · CAR · COT o With MACRD Pump o Drain – Direct Drain · BCT o With MACRD Pump o Drain - Direct Drain · ITC o With MACRD Pump o Drain - Direct Drain o CCSS · DEV: PTD o DEV Nozzle: MGP o Rinse Nozzle: ADR Nozzles o FIRM Nozzle o CCSS · DEV: NTD o NTD Nozzle: IDN Nozzle o CCSS · PIR o IDR Nozzle · BST2 · WISD · WISeCAM · Incoming WISC · Chemical Supply · IFB -ASML · On Line -GJG · Chemical Auto Supply (COT,DEV) · T&H Controller : Customer Provided · Chemical Filter: Customer Provided · Smart Bypass · Individual EV · Ingenio GL License: OEM support/Buyer · Parameter Upload · Dispense Line Monitor · SAFETY Spec · Defect Item (IFF-R/IR/SCS) · AFF-R · PR Usage Monitoring · Double Containment Piping · Fixation Bracket · Essential Common Spec · AC Power Box EFEM Power Option · RAC, SMM · RF-ID (ICHOR), RCS, PR Usage Monitoring · Source Parameter FDC Upload · PCS2 Pump, HP AMC Valve, SPO · Bevel Rinse · BST2 Defense System 2.0 · BST2 Shower Bath · WEE N2 Purge FDC Upload · P Chamber N2 Purge Miss-Connection Detection

OEMモデルの説明

The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.