説明
説明なし構成
Track Configuration Coat cups- 2 Developer cups- 3 ADH (TAD)- 2 Resist reduction- RRC Developer nozzle- SH Oven Configuration PEB- CLHP x4 COT- CLHP x3 / HCP x2 DEV- HCP x1 Stepper- HCP x2 Post bake- LHP x4 Resist & Chemicals Resist pump- RDS 4 ml, 10 ml Resist supply- Gallon bottle Thinner- OK73OEMモデルの説明
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.ドキュメント
ドキュメントなし
カテゴリ
Coaters & Developers
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150243
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
LITHIUS Pro Z
カテゴリ
Coaters & Developers
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150243
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Track Configuration Coat cups- 2 Developer cups- 3 ADH (TAD)- 2 Resist reduction- RRC Developer nozzle- SH Oven Configuration PEB- CLHP x4 COT- CLHP x3 / HCP x2 DEV- HCP x1 Stepper- HCP x2 Post bake- LHP x4 Resist & Chemicals Resist pump- RDS 4 ml, 10 ml Resist supply- Gallon bottle Thinner- OK73OEMモデルの説明
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.ドキュメント
ドキュメントなし