説明
FTGHOSE CONN 1/2H X 1/2 MPT SST構成
構成なしOEMモデルの説明
AMP 3300 PLASMA DEPOSITION SYSTEMS Superior film qualities, both nitride and oxide, guaranteed uniformities, and proven reliability have made the AMP 3300 popular for a wide range of plasma passivation and interlayer applications. Recent process developments have led to an improved method of gas distribution employing a perforated electrode. This provides for uniform gas composition across the entire wafer platen, resulting in consistent film characteristics on every wafer.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
109326
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
AMP 3300
カテゴリ
CVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
109326
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
FTGHOSE CONN 1/2H X 1/2 MPT SST構成
構成なしOEMモデルの説明
AMP 3300 PLASMA DEPOSITION SYSTEMS Superior film qualities, both nitride and oxide, guaranteed uniformities, and proven reliability have made the AMP 3300 popular for a wide range of plasma passivation and interlayer applications. Recent process developments have led to an improved method of gas distribution employing a perforated electrode. This provides for uniform gas composition across the entire wafer platen, resulting in consistent film characteristics on every wafer.ドキュメント
ドキュメントなし