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APPLIED MATERIALS (AMAT) AMP 3300
    説明
    FTG HOSE CONN 1/2H X 1/2MNPT SST
    構成
    構成なし
    OEMモデルの説明
    AMP 3300 PLASMA DEPOSITION SYSTEMS Superior film qualities, both nitride and oxide, guaranteed uniformities, and proven reliability have made the AMP 3300 popular for a wide range of plasma passivation and interlayer applications. Recent process developments have led to an improved method of gas distribution employing a perforated electrode. This provides for uniform gas composition across the entire wafer platen, resulting in consistent film characteristics on every wafer.
    ドキュメント

    ドキュメントなし

    APPLIED MATERIALS (AMAT)

    AMP 3300

    verified-listing-icon

    検証済み

    カテゴリ
    CVD

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    109312


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) AMP 3300

    APPLIED MATERIALS (AMAT)

    AMP 3300

    CVD
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT)

    AMP 3300

    verified-listing-icon
    検証済み
    カテゴリ
    CVD
    最終検証: 60日以上前
    listing-photo-efacd524bff6411c978bd618cbb2fb6e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    109312


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    FTG HOSE CONN 1/2H X 1/2MNPT SST
    構成
    構成なし
    OEMモデルの説明
    AMP 3300 PLASMA DEPOSITION SYSTEMS Superior film qualities, both nitride and oxide, guaranteed uniformities, and proven reliability have made the AMP 3300 popular for a wide range of plasma passivation and interlayer applications. Recent process developments have led to an improved method of gas distribution employing a perforated electrode. This provides for uniform gas composition across the entire wafer platen, resulting in consistent film characteristics on every wafer.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) AMP 3300

    APPLIED MATERIALS (AMAT)

    AMP 3300

    CVDヴィンテージ: 0状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) AMP 3300

    APPLIED MATERIALS (AMAT)

    AMP 3300

    CVDヴィンテージ: 0状態: 中古最終検証:60日以上前