説明
P500038 with 4 Chambers Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Chambers 4 Power Requirements 200-208 V 180.0 A 50/60 Hz構成
Chamber A/B TEOS Chamber C/D EtchOEMモデルの説明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147426
ウェーハサイズ：
不明
ヴィンテージ：
1992
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
P5000 CVD
カテゴリ
CVD
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147426
ウェーハサイズ：
不明
ヴィンテージ：
1992
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
P500038 with 4 Chambers Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Chambers 4 Power Requirements 200-208 V 180.0 A 50/60 Hz構成
Chamber A/B TEOS Chamber C/D EtchOEMモデルの説明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.ドキュメント
ドキュメントなし