説明
Main System - Mini Controller Interface - Open Cassette Main System - 2 chamber P5000 platform Main System - RF Rack Main System - VME Controller Handler System - LL Robot構成
CIM - SECS Process - NitrideOEMモデルの説明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 昨日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146722
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1989
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
P5000 CVD
カテゴリ
CVD
最終検証： 昨日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146722
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1989
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Main System - Mini Controller Interface - Open Cassette Main System - 2 chamber P5000 platform Main System - RF Rack Main System - VME Controller Handler System - LL Robot構成
CIM - SECS Process - NitrideOEMモデルの説明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.ドキュメント
ドキュメントなし