メインコンテンツにスキップ
Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) PRODUCER
    説明
    0041-79433 FACEPLATE TEOS HIGH DEP RATE 300 MM PRODUCER SA TEOS Faceplate 300mm Faceplate AMAT Faceplate Applied Materials Faceplate Producer Faceplate TEOS CVD FaceplateCVD Faceplate Semiconductor Faceplate Gas Distribution Faceplate OEM Replacement Parts (High Deposition RateThe design features uniform gas distribution, improved film thickness uniformity, high temperature resistance, corrosion resistance, low particulate contamination, and extended service life, effectively enhancing... TEOS CVD Process efficiency and stability. 2. Customized specifications We can customize the hole diameter, number of holes, size, tolerance, material (aluminum alloy, etc.), and surface treatment according to drawings or samples. Anodize , Y ₂ O ₃ (etc.) and packaging, support OEM Manufactured to specifications. 3. OEM / ODM Serve We provide reverse engineering, sample mapping, micro-hole fabrication, CNC Precision machining, surface treatment, quality inspection, cleanroom cleaning and packaging, and mass production services. 4. Advantages of OEM semiconductor Faceplate Processing experience, high-precision micro-hole machining capabilities, excellent hole position consistency, strict quality control, and fast delivery. OEM Substitutability and stable process quality. 5. Enterprise Products / Industrial Applications Applicable to Applied Materials ( AMAT ) Producer 300mm CVD Equipment, used in TEOS High Deposition Rate ( HDR Thin film deposition processes provide uniform gas distribution, improve film quality, and are suitable for equipment maintenance, preventative care, and repair. OEM Replace the parts. 6. Service Process Requirements confirmation → Image/Sample Evaluation → Engineering Analysis → Quotation → Prototyping → Mass production → Quality Inspection → Clean packaging → Shipment. OEM P/N : 0041-79433 Product Name : FACEPLATE, TEOS HIGH DEP RATE 300MM PRODUCER SA Applicable equipment: Applied Materials Producer 300mm CVD Applicable processes: TEOS High Deposition Rate ( HDR ) CVD belong Faceplate (Gas distribution panel) Main function: Provides high deposition rate TEOSUniform gas distribution required for the process improves film thickness uniformity, reduces particulate contamination, and enhances process stability.
    構成
    構成なし
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    CVD

    最終検証: 11日前

    主なアイテムの詳細

    状態:

    Parts Tool


    稼働ステータス:

    不明


    製品ID:

    152838


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) PRODUCER

    APPLIED MATERIALS (AMAT)

    PRODUCER

    CVD
    ヴィンテージ: 0状態: 部品ツール
    最終確認10日前

    APPLIED MATERIALS (AMAT)

    PRODUCER

    verified-listing-icon
    検証済み
    カテゴリ
    CVD
    最終検証: 11日前
    listing-photo-55efe01ec3ec4a79b7229e42d12518c7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/93093/55efe01ec3ec4a79b7229e42d12518c7/9c952c11ced64e2db1539ee958fdafed_7_mw.png
    listing-photo-55efe01ec3ec4a79b7229e42d12518c7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/93093/55efe01ec3ec4a79b7229e42d12518c7/728b2c0d049543bc9fe8fc7bc7658fc8_8_mw.png
    listing-photo-55efe01ec3ec4a79b7229e42d12518c7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/93093/55efe01ec3ec4a79b7229e42d12518c7/5f88e0160ab94c0b812c04e233515b6c_6_mw.png
    listing-photo-55efe01ec3ec4a79b7229e42d12518c7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/93093/55efe01ec3ec4a79b7229e42d12518c7/90c22aac96e340f3b2156519ed2d4e4a_9_mw.png
    主なアイテムの詳細

    状態:

    Parts Tool


    稼働ステータス:

    不明


    製品ID:

    152838


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    0041-79433 FACEPLATE TEOS HIGH DEP RATE 300 MM PRODUCER SA TEOS Faceplate 300mm Faceplate AMAT Faceplate Applied Materials Faceplate Producer Faceplate TEOS CVD FaceplateCVD Faceplate Semiconductor Faceplate Gas Distribution Faceplate OEM Replacement Parts (High Deposition RateThe design features uniform gas distribution, improved film thickness uniformity, high temperature resistance, corrosion resistance, low particulate contamination, and extended service life, effectively enhancing... TEOS CVD Process efficiency and stability. 2. Customized specifications We can customize the hole diameter, number of holes, size, tolerance, material (aluminum alloy, etc.), and surface treatment according to drawings or samples. Anodize , Y ₂ O ₃ (etc.) and packaging, support OEM Manufactured to specifications. 3. OEM / ODM Serve We provide reverse engineering, sample mapping, micro-hole fabrication, CNC Precision machining, surface treatment, quality inspection, cleanroom cleaning and packaging, and mass production services. 4. Advantages of OEM semiconductor Faceplate Processing experience, high-precision micro-hole machining capabilities, excellent hole position consistency, strict quality control, and fast delivery. OEM Substitutability and stable process quality. 5. Enterprise Products / Industrial Applications Applicable to Applied Materials ( AMAT ) Producer 300mm CVD Equipment, used in TEOS High Deposition Rate ( HDR Thin film deposition processes provide uniform gas distribution, improve film quality, and are suitable for equipment maintenance, preventative care, and repair. OEM Replace the parts. 6. Service Process Requirements confirmation → Image/Sample Evaluation → Engineering Analysis → Quotation → Prototyping → Mass production → Quality Inspection → Clean packaging → Shipment. OEM P/N : 0041-79433 Product Name : FACEPLATE, TEOS HIGH DEP RATE 300MM PRODUCER SA Applicable equipment: Applied Materials Producer 300mm CVD Applicable processes: TEOS High Deposition Rate ( HDR ) CVD belong Faceplate (Gas distribution panel) Main function: Provides high deposition rate TEOSUniform gas distribution required for the process improves film thickness uniformity, reduces particulate contamination, and enhances process stability.
    構成
    構成なし
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) PRODUCER

    APPLIED MATERIALS (AMAT)

    PRODUCER

    CVDヴィンテージ: 0状態: 部品ツール最終検証:10日前
    APPLIED MATERIALS (AMAT) PRODUCER

    APPLIED MATERIALS (AMAT)

    PRODUCER

    CVDヴィンテージ: 0状態: 部品ツール最終検証:11日前
    APPLIED MATERIALS (AMAT) PRODUCER

    APPLIED MATERIALS (AMAT)

    PRODUCER

    CVDヴィンテージ: 0状態: 部品ツール最終検証:60日以上前