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AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
説明
説明なし
構成
構成なし
OEMモデルの説明
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.
ドキュメント

ドキュメントなし

カテゴリ
CVD

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

114450


ウェーハサイズ:

不明


ヴィンテージ:

1995


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AVIZA / WATKINS-JOHNSON

WJ-999R

verified-listing-icon
検証済み
カテゴリ
CVD
最終検証: 60日以上前
listing-photo-05df62530fa94ce58cd0c28fbcfb8f72-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/05df62530fa94ce58cd0c28fbcfb8f72/da8b6b74068e40f894e56b733a30175d_9e110ad981314411b0f99ad4ae5234d31201a_mw.jpeg
listing-photo-05df62530fa94ce58cd0c28fbcfb8f72-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/05df62530fa94ce58cd0c28fbcfb8f72/d9d2024b975d4572946c0c3f5f009598_ba7a0342a8ad4e5491a0bded9d3c59a51201a_mw.jpeg
listing-photo-05df62530fa94ce58cd0c28fbcfb8f72-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/05df62530fa94ce58cd0c28fbcfb8f72/0fea3230e57f4d7dba06ed6da1137a91_1cb6f4f2fcdf42398129fbabfc47960e1201a_mw.jpeg
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

114450


ウェーハサイズ:

不明


ヴィンテージ:

1995


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし
構成
構成なし
OEMモデルの説明
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.
ドキュメント

ドキュメントなし