We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 続きを読む
説明
C1 Line, A1 Underfloor Storage Facility構成
構成なしOEMモデルの説明
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 27日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
124691
ウェーハサイズ：
5"/125mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
AVIZA / WATKINS-JOHNSON
WJ-999R
カテゴリ
CVD
最終検証： 27日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
124691
ウェーハサイズ：
5"/125mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
C1 Line, A1 Underfloor Storage Facility構成
構成なしOEMモデルの説明
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.ドキュメント
ドキュメントなし