説明
Standalone Sputter構成
Configured for CUSEED process Mainframe SMIF factory interfaces (QTY 2) Robot handlers (QTY 2) CIM: GEM Process: CUSEEDOEMモデルの説明
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
155107
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH / NOVELLUS
INOVA
カテゴリ
CVD
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
155107
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Standalone Sputter構成
Configured for CUSEED process Mainframe SMIF factory interfaces (QTY 2) Robot handlers (QTY 2) CIM: GEM Process: CUSEEDOEMモデルの説明
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.ドキュメント
ドキュメントなし