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説明
Condition: very clean and completely decontaminated. No acid or corrosion is present. The tool was maintained, upgraded and serviced throughout it's life by the OEM.構成
CVD SYSTEM, 2 CHAMBER WSi Process DE-INSTALL DATE: FEB 2008 System was running production until shut down In elect rack: 1x Ebara TMP controller (306W), CVD Utility controller SECS/GEM: YES CE MARK: YES Main Frame MBB730 (2 x Wsix Deposition chambers) Gases: N2 (Ox) 4lmin N2 (Red) 125l/min Ar 1000 sccm WF6 10sccm ClF3 1000sccm DCS 1000sccm Other utilities:- Voltage 208V +/- 10% 60Hz 70 KVA Water 5Kgf/cm2 max Water flow 20 l/min Water temp 15-25 celcius Exhaust volume 2.1 m3/min Air 5.7 =/- 0.3 Kgf/cm3 220 l/min Earth class 3 GND islotaed Weight 2300 kg room temp 20-25 c, humidility 40-55%OEMモデルの説明
Chemical vapor deposition (CVD) system designed for tungsten (W) and tungsten silicide (WSi) processes on 200-mm wafers. It features two process chambers and is optimized for electrode and wiring manufacturing. The system employs a ramp heating method, allowing it to accommodate products requiring different temperature zones, making it suitable for low-volume, multi-product manufacturing. Additionally, it utilizes plasma-free dry cleaning with chlorine trifluoride (ClF₃), which extends wet cleaning cycles and reduces running costs.ドキュメント
ドキュメントなし
カテゴリ
CVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
53589
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
MB2-730 HT-HT
カテゴリ
CVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
53589
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Condition: very clean and completely decontaminated. No acid or corrosion is present. The tool was maintained, upgraded and serviced throughout it's life by the OEM.構成
CVD SYSTEM, 2 CHAMBER WSi Process DE-INSTALL DATE: FEB 2008 System was running production until shut down In elect rack: 1x Ebara TMP controller (306W), CVD Utility controller SECS/GEM: YES CE MARK: YES Main Frame MBB730 (2 x Wsix Deposition chambers) Gases: N2 (Ox) 4lmin N2 (Red) 125l/min Ar 1000 sccm WF6 10sccm ClF3 1000sccm DCS 1000sccm Other utilities:- Voltage 208V +/- 10% 60Hz 70 KVA Water 5Kgf/cm2 max Water flow 20 l/min Water temp 15-25 celcius Exhaust volume 2.1 m3/min Air 5.7 =/- 0.3 Kgf/cm3 220 l/min Earth class 3 GND islotaed Weight 2300 kg room temp 20-25 c, humidility 40-55%OEMモデルの説明
Chemical vapor deposition (CVD) system designed for tungsten (W) and tungsten silicide (WSi) processes on 200-mm wafers. It features two process chambers and is optimized for electrode and wiring manufacturing. The system employs a ramp heating method, allowing it to accommodate products requiring different temperature zones, making it suitable for low-volume, multi-product manufacturing. Additionally, it utilizes plasma-free dry cleaning with chlorine trifluoride (ClF₃), which extends wet cleaning cycles and reduces running costs.ドキュメント
ドキュメントなし