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KLA AIT I
    説明
    Operational upon removal from the fab. Skidded, vapor barrier bagged, wrapped. Not crated. Complete systems, with no missing parts.
    構成
    構成なし
    OEMモデルの説明
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Defect Inspection

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    131730


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA AIT I

    KLA

    AIT I

    Defect Inspection
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    KLA

    AIT I

    verified-listing-icon
    検証済み
    カテゴリ
    Defect Inspection
    最終検証: 60日以上前
    listing-photo-3e5bf487751746baa8c7fe6f6848062b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    131730


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Operational upon removal from the fab. Skidded, vapor barrier bagged, wrapped. Not crated. Complete systems, with no missing parts.
    構成
    構成なし
    OEMモデルの説明
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA AIT I

    KLA

    AIT I

    Defect Inspectionヴィンテージ: 0状態: 中古最終検証:60日以上前
    KLA AIT I

    KLA

    AIT I

    Defect Inspectionヴィンテージ: 1997状態: 中古最終検証:60日以上前
    KLA AIT I

    KLA

    AIT I

    Defect Inspectionヴィンテージ: 2008状態: 改修済み最終検証:60日以上前