説明
Film Thickness Measurement構成
[Power-on] 2port(TDK), Yaskawa(Aligner, Robot) / *Need to check Fine Z-stage focus(Fail).OEMモデルの説明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.ドキュメント
ドキュメントなし
KLA
SPECTRAFX 200
検証済み
カテゴリ
Defect Inspection
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
95294
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
SPECTRAFX 200
検証済み
カテゴリ
Defect Inspection
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
95294
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Film Thickness Measurement構成
[Power-on] 2port(TDK), Yaskawa(Aligner, Robot) / *Need to check Fine Z-stage focus(Fail).OEMモデルの説明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.ドキュメント
ドキュメントなし