We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 続きを読む
説明
KLA2800 Lamp構成
構成なしOEMモデルの説明
The 2800 Series is a next-generation broadband DUV/UV/VIS patterned wafer inspection platform for sub-65-nm design rule development and production. It delivers maximum sensitivity, 2X better throughput than previous-generation DUV tools, and has a roadmap that extends to 45-nm and beyond design rules. It offers an array of optical modes and accelerates time to results with advanced binning and realtime defect classification. The 2800 Series is suited for unique applications such as Photo Cell Monitoring, Process Window Qualification, and Micro After-Develop Inspection. It complements the Puma 9000 Series darkfield platform and eS3x electron-beam inspection system to enable a comprehensive defect inspection strategy.ドキュメント
ドキュメントなし
KLA
2800
カテゴリ
Defect Inspection
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
101300
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
KLA2800 Lamp構成
構成なしOEMモデルの説明
The 2800 Series is a next-generation broadband DUV/UV/VIS patterned wafer inspection platform for sub-65-nm design rule development and production. It delivers maximum sensitivity, 2X better throughput than previous-generation DUV tools, and has a roadmap that extends to 45-nm and beyond design rules. It offers an array of optical modes and accelerates time to results with advanced binning and realtime defect classification. The 2800 Series is suited for unique applications such as Photo Cell Monitoring, Process Window Qualification, and Micro After-Develop Inspection. It complements the Puma 9000 Series darkfield platform and eS3x electron-beam inspection system to enable a comprehensive defect inspection strategy.ドキュメント
ドキュメントなし