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KLA PUMA 9150
    説明
    Darkfield Inspection
    構成
    構成なし
    OEMモデルの説明
    The Puma 9150 is a Laser Imaging Patterned Wafer Inspection System developed by KLA Corporation. It combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers. The Puma 9150 provides enhanced capture of low profile, large area defects, such as underpolish and slurry residues from copper CMP. It also improves darkfield defect capture in etch applications, such as microbridges and partially or fully blocked vias.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Defect Inspection

    最終検証: 19日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    147692


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA PUMA 9150

    KLA

    PUMA 9150

    Defect Inspection
    ヴィンテージ: 0状態: 中古
    最終確認19日前

    KLA

    PUMA 9150

    verified-listing-icon
    検証済み
    カテゴリ
    Defect Inspection
    最終検証: 19日前
    listing-photo-4563dea52e724235a2d187566c26eea1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    147692


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Darkfield Inspection
    構成
    構成なし
    OEMモデルの説明
    The Puma 9150 is a Laser Imaging Patterned Wafer Inspection System developed by KLA Corporation. It combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers. The Puma 9150 provides enhanced capture of low profile, large area defects, such as underpolish and slurry residues from copper CMP. It also improves darkfield defect capture in etch applications, such as microbridges and partially or fully blocked vias.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA PUMA 9150

    KLA

    PUMA 9150

    Defect Inspectionヴィンテージ: 0状態: 中古最終検証:19日前