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KLA 2835
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
    ドキュメント

    ドキュメントなし

    KLA

    2835

    verified-listing-icon

    検証済み

    カテゴリ
    Defect Inspection

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    12840


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA 2835

    KLA

    2835

    Defect Inspection
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    KLA

    2835

    verified-listing-icon
    検証済み
    カテゴリ
    Defect Inspection
    最終検証: 60日以上前
    listing-photo-44c914f57040ad3ebc8f9a18847287ed073363863c6fdaf860de81d12bbcf900-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    12840


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA 2835

    KLA

    2835

    Defect Inspectionヴィンテージ: 0状態: 中古最終検証:60日以上前