説明
WxZ(STD)構成
3C/HOEMモデルの説明
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.ドキュメント
ドキュメントなし
カテゴリ
Deposition
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
112358
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA MCVD
カテゴリ
Deposition
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
112358
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
WxZ(STD)構成
3C/HOEMモデルの説明
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.ドキュメント
ドキュメントなし