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APPLIED MATERIALS (AMAT) CENTURA MCVD
    説明
    CVD
    構成
    4C/H
    OEMモデルの説明
    The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.
    ドキュメント

    ドキュメントなし

    APPLIED MATERIALS (AMAT)

    CENTURA MCVD

    verified-listing-icon

    検証済み

    カテゴリ
    Deposition

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    112353


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA MCVD

    APPLIED MATERIALS (AMAT)

    CENTURA MCVD

    Deposition
    ヴィンテージ: 2006状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT)

    CENTURA MCVD

    verified-listing-icon
    検証済み
    カテゴリ
    Deposition
    最終検証: 60日以上前
    listing-photo-2f7121a8a3a84dcaa73cfccd8680d91d-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    112353


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    CVD
    構成
    4C/H
    OEMモデルの説明
    The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA MCVD

    APPLIED MATERIALS (AMAT)

    CENTURA MCVD

    Depositionヴィンテージ: 2006状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) CENTURA MCVD

    APPLIED MATERIALS (AMAT)

    CENTURA MCVD

    Depositionヴィンテージ: 2002状態: 中古最終検証:12日前
    APPLIED MATERIALS (AMAT) CENTURA MCVD

    APPLIED MATERIALS (AMAT)

    CENTURA MCVD

    Depositionヴィンテージ: 2000状態: 中古最終検証:12日前