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LAM RESEARCH / NOVELLUS INOVA
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH / NOVELLUS

    INOVA

    verified-listing-icon

    検証済み

    カテゴリ
    Deposition

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    98733


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS INOVA

    LAM RESEARCH / NOVELLUS

    INOVA

    Deposition
    ヴィンテージ: 2012状態: 中古
    最終確認30日以上前

    LAM RESEARCH / NOVELLUS

    INOVA

    verified-listing-icon
    検証済み
    カテゴリ
    Deposition
    最終検証: 60日以上前
    listing-photo-4f8856375ce8402cba4cfdb532b60c9f-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    98733


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS INOVA

    LAM RESEARCH / NOVELLUS

    INOVA

    Depositionヴィンテージ: 2012状態: 中古最終検証:30日以上前
    LAM RESEARCH / NOVELLUS INOVA

    LAM RESEARCH / NOVELLUS

    INOVA

    Depositionヴィンテージ: 1999状態: 中古最終検証:30日以上前
    LAM RESEARCH / NOVELLUS INOVA

    LAM RESEARCH / NOVELLUS

    INOVA

    Depositionヴィンテージ: 2012状態: 中古最終検証:30日以上前