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LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS
    説明
    説明なし
    構成
    WCVD
    OEMモデルの説明
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    verified-listing-icon

    検証済み

    カテゴリ
    Deposition

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    107383


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2005


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Deposition
    ヴィンテージ: 2006状態: 中古
    最終確認60日以上前

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    verified-listing-icon
    検証済み
    カテゴリ
    Deposition
    最終検証: 60日以上前
    listing-photo-abd7304850a34e3d99c6a0b1554bba34-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    107383


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2005


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    WCVD
    OEMモデルの説明
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Depositionヴィンテージ: 2006状態: 中古最終検証:60日以上前
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Depositionヴィンテージ: 2005状態: 中古最終検証:60日以上前
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Depositionヴィンテージ: 2007状態: 中古最終検証:60日以上前