説明
Poly/RIE(Cent/Nor)構成
Poly/RIE(Cent/Nor)OEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA
検証済み
カテゴリ
Dry Etch
最終検証: 18日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
98115
ウェーハサイズ:
不明
ヴィンテージ:
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示APPLIED MATERIALS (AMAT)
CENTURA
カテゴリ
Dry Etch
最終検証: 18日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
98115
ウェーハサイズ:
不明
ヴィンテージ:
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Poly/RIE(Cent/Nor)構成
Poly/RIE(Cent/Nor)OEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし