CENTURA
概要(Overview)
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.
現在の掲載品
19
サービス
検査、保証、鑑定、ロジスティクス
APPLIED MATERIALS (AMAT)
CENTURA
Dry / Plasma Etchヴィンテージ: 2007状態: 中古最終確認60日以上前APPLIED MATERIALS (AMAT)
CENTURA
Dry / Plasma Etchヴィンテージ: 2000状態: 中古最終確認60日以上前APPLIED MATERIALS (AMAT)
CENTURA
Dry / Plasma Etchヴィンテージ: 1997状態: 中古最終確認60日以上前APPLIED MATERIALS (AMAT)
CENTURA
Dry / Plasma Etchヴィンテージ: 状態: 中古最終確認60日以上前