説明
説明なし構成
Metal Etcher (4 Chamber) 208V, 50/60 Hz, with Transfer Chamber Lift, HP Robot with Metal Blade, Endpoint with Four Monochromators, Smoke and Water Leak Detect, Independent Helium Cooling, Seriplex Gas Panel w/Top Feed Exhaust, Wafer Mapping, Wafer on Blade Sensors and Umbilicals. Chamber Breakdown Includes: [Chamber A: DPS R0 Poly, w/1110-01043 Source RF match AZX 90; Dual manometers with .1Torr and 10Torr Heads, Backside Helium Cooling; 200mm Cathode, & Osaka TG2003M Turbo] [Chamber B: Poly Etch: Mark II 3 Piece Chamber; Mark II Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber C: Poly Etch: Uni-Body Chamber; MxP Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber D: DPS R1 Metal/Deep Trench Etch: Source RF Match w/AZX-90 Upgrade, Dual Manometers with .1Torr and 10Torr Heads, VAT Throttling Gate Valve, Heated Pump Stack, 200mm Cathode SNNF ESC, & Alcatel ATH 1300M Turbo] [Chamber E: Wafer Orienter, 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] [Chamber F: Wafer Orienter , 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] Remote Equipment Includes: (1ea.) RF Rack with the Following Configured Generators: [(1ea.) Advanced Energy RFG/AZX Control; (2ea.) Advanced Energy RF-20RWC; (2ea.) ENI OEM 12B-02; (1ea.) ENI OEM 12B3 and (1ea.) Osaka TD2000 turbo controller]; (2ea.) Neslab HX150 with Heater Control; (1ea.) Neslab HX150 without Heater Control; (3ea.) Edwards IH80 Pumps; & (2ea.) Alcatel ADP81 Pumps.OEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
57415
ウェーハサイズ：
不明
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
57415
ウェーハサイズ：
不明
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Metal Etcher (4 Chamber) 208V, 50/60 Hz, with Transfer Chamber Lift, HP Robot with Metal Blade, Endpoint with Four Monochromators, Smoke and Water Leak Detect, Independent Helium Cooling, Seriplex Gas Panel w/Top Feed Exhaust, Wafer Mapping, Wafer on Blade Sensors and Umbilicals. Chamber Breakdown Includes: [Chamber A: DPS R0 Poly, w/1110-01043 Source RF match AZX 90; Dual manometers with .1Torr and 10Torr Heads, Backside Helium Cooling; 200mm Cathode, & Osaka TG2003M Turbo] [Chamber B: Poly Etch: Mark II 3 Piece Chamber; Mark II Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber C: Poly Etch: Uni-Body Chamber; MxP Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber D: DPS R1 Metal/Deep Trench Etch: Source RF Match w/AZX-90 Upgrade, Dual Manometers with .1Torr and 10Torr Heads, VAT Throttling Gate Valve, Heated Pump Stack, 200mm Cathode SNNF ESC, & Alcatel ATH 1300M Turbo] [Chamber E: Wafer Orienter, 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] [Chamber F: Wafer Orienter , 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] Remote Equipment Includes: (1ea.) RF Rack with the Following Configured Generators: [(1ea.) Advanced Energy RFG/AZX Control; (2ea.) Advanced Energy RF-20RWC; (2ea.) ENI OEM 12B-02; (1ea.) ENI OEM 12B3 and (1ea.) Osaka TD2000 turbo controller]; (2ea.) Neslab HX150 with Heater Control; (1ea.) Neslab HX150 without Heater Control; (3ea.) Edwards IH80 Pumps; & (2ea.) Alcatel ADP81 Pumps.OEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし