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APPLIED MATERIALS (AMAT) CENTURA
    説明
    説明なし
    構成
    Centura Frame
    OEMモデルの説明
    The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.
    ドキュメント

    ドキュメントなし

    APPLIED MATERIALS (AMAT)

    CENTURA

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Parts Tool


    稼働ステータス:

    不明


    製品ID:

    72765


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etch
    ヴィンテージ: 2007状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT)

    CENTURA

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
    listing-photo-3368ea1f70e8457cad67c479a688124b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Parts Tool


    稼働ステータス:

    不明


    製品ID:

    72765


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Centura Frame
    OEMモデルの説明
    The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etchヴィンテージ: 2007状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etchヴィンテージ: 2000状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etchヴィンテージ: 1997状態: 中古最終検証:60日以上前