メインコンテンツにスキップ
Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) CENTURA HART AP
    説明
    1/1/26
    構成
    構成なし
    OEMモデルの説明
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 28日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    148016


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認28日前

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 28日前
    listing-photo-6bf97c7ad1f44f1ebbb5a3720af3e088-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    148016


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    1/1/26
    構成
    構成なし
    OEMモデルの説明
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:28日前
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:28日前
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:28日前