説明

Diener Nano Q Low-Pressure Plasma Cleaner/Asher/Treatment System Chamber Type F Description: Chamber Configuration: Round Vacuum Chamber Material: Quartz glass Chamber Cover: Hinged door Cover Material: Aluminum, glass pane Inner Diameter: 240 mm Opening Diameter of Recipient: 230 mm approx. Chamber Volume: 27 liters approx. Application Areas: For ultra pure plasma processes, bulk production and manufacturing Tray Type D Description: Tray Configuration: Flat Adapter for the Following Chamber Configuration: Round Material: Quartz glass Dimensions: 230 mm W x 580 mm D x 5 mm H Qty. of Possible Trays: 1 Application Areas: Ultra pure plasma processes Additional Type J Description: Tray Configuration: Quartz glass boat Adapter for the Following Chamber Configuration: Round Material: Quartz glass Dimensions: 4" - 300 mm L for 25 pcs. Wafer Qty. of Possible Trays: 1 Application Areas: Ultra pure plasma processes, Wafer treatment Electrode Type A Description: Configuration: Standard electrode Adapted for the Following Chamber Configuration: Round Material: Stainless steel / aluminum Application Areas: Standard plasma processes Control Type A Description: Semi Automatic Vacuum pump, gas flow, plasma processes and venting need to be started separately by hand operation Free parameters: process time, power, gas, pressure Generator Type G Description: Frequency: 2.45 GHz Power: 0 - 1200 W Impedance Matching: Fixed Display of Forward Power: Yes Display of Reflected Power: No Safety Switches: Vacuum safety switch and door safety switch PC Interface: Yes Main Applications: Activation, cleaning, etching, semi-conductor (front-end), semi-conductor (back-end), plasma polymerization

構成

The Unit's Serial Number Tag Reads: Type: NANO Q Serial Number: 111432 Power Requirements: 480 VAC, 50/60 Hz, 16 A Date of Manufacture: 2011 CE Marked: Yes Configuration: -Basic unit type E - 600 mm W x 800 mm D x 1800 mm H -Gas supply / Gas channel type A - 2 pcs, stainless steel needle valve - 2 channels -Pirani vacuum sensor -Connections: Nano standalone + conversion (480 V, 16 A) -Vacuum Chamber / Recipient type E/F - Round Quartz glass, hinged door, extended chamber -Tray type D - Quartz glass, extended for 600 mm chamber, Add Type J - Quartz Boat for 4" Wafers -Standard Electrode type A - Round, stainless steel / aluminum -Control type A - semi automatic -Generator type G - 2.45 GHz, 0 ~ 1200 W

OEMモデルの説明

NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.