説明
説明なし構成
Plasma SystemOEMモデルの説明
NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
155221
ウェーハサイズ：
不明
ヴィンテージ：
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
DIENER ELECTRONIC
NANO
カテゴリ
Dry / Plasma Etch
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
155221
ウェーハサイズ：
不明
ヴィンテージ：
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Plasma SystemOEMモデルの説明
NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.ドキュメント
ドキュメントなし