説明
説明なし構成
構成なしOEMモデルの説明
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.ドキュメント
ドキュメントなし
LAM RESEARCH CORPORATION
AUTOETCH 590
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
63177
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
AUTOETCH 590
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
63177
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.ドキュメント
ドキュメントなし