説明
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.構成
Main Etcher Materials: SiO2 etc.OEMモデルの説明
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 8日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
138623
ウェーハサイズ：
4"/100mm, 6"/150mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH CORPORATION
AUTOETCH 590
カテゴリ
Dry / Plasma Etch
最終検証： 8日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
138623
ウェーハサイズ：
4"/100mm, 6"/150mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.構成
Main Etcher Materials: SiO2 etc.OEMモデルの説明
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.ドキュメント
ドキュメントなし