説明
説明なし構成
LAM Kiyo 45 Chamber Has missing partsOEMモデルの説明
The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.ドキュメント
ドキュメントなし
LAM RESEARCH CORPORATION
2300 VERSYS KIYO45
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
Deinstalled
製品ID：
97779
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 VERSYS KIYO45
カテゴリ
Dry / Plasma Etch
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
Deinstalled
製品ID：
97779
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
LAM Kiyo 45 Chamber Has missing partsOEMモデルの説明
The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.ドキュメント
ドキュメントなし