説明
Refurbished in 2024, not used since.構成
構成なしOEMモデルの説明
The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
Deinstalled
製品ID：
152308
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH CORPORATION
TCP 9600SE
カテゴリ
Dry / Plasma Etch
最終検証： 13日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
Deinstalled
製品ID：
152308
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Refurbished in 2024, not used since.構成
構成なしOEMモデルの説明
The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.ドキュメント
ドキュメントなし