説明

TEL Tactras Vigus LK3 Asset Description TEL Tactras Software Version Ver6.80Rev502 CIM None Process Vigus BEOL Excluded Items List (Pumps, Chillers & Abatement are all excluded) Description Quantity HV Power Supply 1 ESC 3

構成

System Type Description Quantity Handler System NONE Others Main System Chambers 6 Factory Interface NONE Options System

OEMモデルの説明

Tactras™ Vigus™ is a highly reliable 300mm plasma etch system that enhances etch process productivity. It provides customized options for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL. The system is designed to deliver excellent wafer uniformity, low wafer-to-wafer variation, and high selectivity for thin film stop layers while maintaining a high etch rate. Up to 6 Vigus™ chambers can be installed on the Tactras™ platform. Tactras™ Vigus™ contributes to maximizing productivity for semiconductor manufacturers with industry-leading tool availability by minimizing offset in machine-to-machine and chamber-to-chamber with robust design, particle reduction techniques, introducing unit-assembly inspection method before shipment, and unique labor-saving automated functions. Overall, Tactras™ Vigus™ is a highly efficient and versatile etching system that offers many benefits to its users.