
説明
Semitool Equinox(Acid Etch) For Wet etch Process Size: 190*160*192 Weight: 1150 Spare parts: Yes構成
構成なしOEMモデルの説明
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.ドキュメント
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同様のリスト
すべて表示SEMITOOL
EQUINOX
カテゴリ
Electro Plating
最終検証: 4日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
141393
ウェーハサイズ:
不明
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Semitool Equinox(Acid Etch) For Wet etch Process Size: 190*160*192 Weight: 1150 Spare parts: Yes構成
構成なしOEMモデルの説明
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.ドキュメント
ドキュメントなし