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VEECO / APPLIED EPI / VARIAN GEN II
    説明
    VEECO Gen II MBE Growth system, 3"
    構成
    (10) ports for dopants Process: Growth of arsenides and phosphides Liquid nitrogen Phase separator AlGaAs Laser Room temperature: 6°C - 10°C Vacuum: Growth chamber (GC) Triode ion pump: 400 l/sec Buffer chamber (BC) Triode ion pump: 200 l/sec (2) TSP Controllers Loadlock chamber (LC) (100) CTI Cryotor cryopumps (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED System: 0-10 keV RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cable Riber three zone P Valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells Dual electronic equipment rack, 19" (12) Solenson DC power supplies Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC Power supplies Substrate heater Heated station
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

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    検証済み

    カテゴリ
    Epitaxial deposition (EPI)

    最終検証: 12日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    145622


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)
    ヴィンテージ: 2004状態: 中古
    最終確認12日前

    VEECO / APPLIED EPI / VARIAN

    GEN II

    verified-listing-icon
    検証済み
    カテゴリ
    Epitaxial deposition (EPI)
    最終検証: 12日前
    listing-photo-0b7cfe8258f24712881180c66f70d546-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    145622


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    VEECO Gen II MBE Growth system, 3"
    構成
    (10) ports for dopants Process: Growth of arsenides and phosphides Liquid nitrogen Phase separator AlGaAs Laser Room temperature: 6°C - 10°C Vacuum: Growth chamber (GC) Triode ion pump: 400 l/sec Buffer chamber (BC) Triode ion pump: 200 l/sec (2) TSP Controllers Loadlock chamber (LC) (100) CTI Cryotor cryopumps (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED System: 0-10 keV RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cable Riber three zone P Valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells Dual electronic equipment rack, 19" (12) Solenson DC power supplies Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC Power supplies Substrate heater Heated station
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)ヴィンテージ: 2004状態: 中古最終検証:12日前
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)ヴィンテージ: 0状態: 中古最終検証:29日前
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)ヴィンテージ: 0状態: 中古最終検証:29日前