説明
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし
カテゴリ
Epitaxial deposition (EPI)
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
144927
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / APPLIED EPI / VARIAN
GEN II
カテゴリ
Epitaxial deposition (EPI)
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
144927
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし