説明
Brand new, vacuum-sealed packaging, unopened構成
The uGmni-200E is a Dry Etching System manufactured by ULVAC, Inc., primarily intended for semiconductor production and experiments. It employs an Inductively Super Magnetron (ISM) plasma source and is a cluster-type system.The system is compatible with wafers up to 8 inches in diameter (including 4 and 6-inch). Its structure includes a Transfer Chamber (L0), Cassette Chamber (L1) with SMIF loader, Aligner (L2), and the main Etching Chamber (L3).The L3 Etching Chamber features a Turbo Molecular Pump (TMP) exhaust, optional Electrostatic Chuck (ESC), and sophisticated wafer temperature control via a chiller and Helium (He) gas assistance. Performance specifications guarantee an etching uniformity of $\pm 5\%$ or lower (within wafer) for continuous 8-inch $\text{SiO}_2/\text{Si}$ wafer processing. The system also supports the SECS/GEM communication interfaceOEMモデルの説明
提供なしドキュメント
検証済み
カテゴリ
Etch/Asher
最終検証： 5日前
主なアイテムの詳細
状態：
New
稼働ステータス:
Deinstalled
製品ID：
137506
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
uGmni-200E
カテゴリ
Etch/Asher
最終検証： 5日前
主なアイテムの詳細
状態：
New
稼働ステータス:
Deinstalled
製品ID：
137506
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available