RIE set up for GaN Etch

RF Power: 600W, 13.56MHz

330mm Platen

Water cooled electrode 10C-80C

End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 6 lines including following MFCs:
Ar      - 100sccm
CL     - 100sccm
BCL3 - 100sccm
N2O   - 100sccm

Windows PC , user friendly interface

OXFORD

The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.

OXFORD

PLASMALAB 133

PECVD

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PLASMALAB 133

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PLASMALAB 133

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PLASMALAB 133

OXFORD

PLASMALAB 133

OXFORD

PLASMALAB 133

PLASMALAB 133

PECVD

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PLASMALAB 133

OXFORD

PLASMALAB 133

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PLASMALAB 133

OXFORD

PLASMALAB 133