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OXFORD PLASMALAB 133
    説明
    説明なし
    構成
    Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
    OEMモデルの説明
    The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
    ドキュメント

    ドキュメントなし

    OXFORD

    PLASMALAB 133

    verified-listing-icon

    検証済み

    カテゴリ
    PECVD

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    41126


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD
    ヴィンテージ: 2010状態: 中古
    最終確認60日以上前

    OXFORD

    PLASMALAB 133

    verified-listing-icon
    検証済み
    カテゴリ
    PECVD
    最終検証: 60日以上前
    listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/8f5a026874874f76b31c9888b9cc6571_9b1985a75c794d85976480e38a2e1e871105c_mw.jpeg
    listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/9357a0c198e64914a6a0b5518e6fee85_afcdf732b75f482796eb3a9d29f75a8f1105c_mw.jpeg
    listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/940af5b10b614237999d5fff7d1b6089_f90b32971b1642f48d61b9aea3c249521201a_mw.jpeg
    listing-photo-396c6da0a5fb46cab7448a60a13fcd62-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/396c6da0a5fb46cab7448a60a13fcd62/cfc4a69384e24959af3e1fb9620afc10_cb8c6e0d0ae442bf8ec61aea46093ab71201a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    41126


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
    OEMモデルの説明
    The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVDヴィンテージ: 2010状態: 中古最終検証:60日以上前
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVDヴィンテージ: 0状態: 中古最終検証:60日以上前
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVDヴィンテージ: 0状態: 中古最終検証:60日以上前