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APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
  • APPLIED MATERIALS (AMAT) CENTURA SINGEN
説明
LPCVD
構成
Centura SiNgen Chamber
OEMモデルの説明
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.
ドキュメント

ドキュメントなし

カテゴリ
Furnaces / Diffusion

最終検証: 30日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

72695


ウェーハサイズ:

8"/200mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

CENTURA SINGEN

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カテゴリ
Furnaces / Diffusion
最終検証: 30日以上前
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主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

72695


ウェーハサイズ:

8"/200mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
LPCVD
構成
Centura SiNgen Chamber
OEMモデルの説明
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.
ドキュメント

ドキュメントなし