説明
ASM A400 with one standard Power Poly reactor and one Dope Power Poly reactor.構成
ASMi A400 LPCVD Dope PP & LPCVD std PP reactor Heater type: 5 zones Gas panel layout: SiH4 - N2 - Dopand Brooks MFC's Process pressure: 80 ÷ 120 mTorr Process temperature: 620 - 680 °C Genmark MK4 Robot Paddle temprature control PowerPoly specific flanges temp controlled at 80 °C Gas/smoke detection of SiH4OEMモデルの説明
The ASM AD400 is a diffusion and oxidation furnaces system used in semiconductor manufacturing. It is designed for processing 8-inch wafers with dual tubes or 6-inch wafers with dual boats. The system's body is anodized to resist corrosion, ensuring durability and reliability during wafer processing.ドキュメント
ドキュメントなし
ASM
A400
検証済み
カテゴリ
Furnaces / Diffusion
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
65295
ウェーハサイズ：
不明
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASM
A400
検証済み
カテゴリ
Furnaces / Diffusion
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
65295
ウェーハサイズ：
不明
ヴィンテージ：
1998
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
ASM A400 with one standard Power Poly reactor and one Dope Power Poly reactor.構成
ASMi A400 LPCVD Dope PP & LPCVD std PP reactor Heater type: 5 zones Gas panel layout: SiH4 - N2 - Dopand Brooks MFC's Process pressure: 80 ÷ 120 mTorr Process temperature: 620 - 680 °C Genmark MK4 Robot Paddle temprature control PowerPoly specific flanges temp controlled at 80 °C Gas/smoke detection of SiH4OEMモデルの説明
The ASM AD400 is a diffusion and oxidation furnaces system used in semiconductor manufacturing. It is designed for processing 8-inch wafers with dual tubes or 6-inch wafers with dual boats. The system's body is anodized to resist corrosion, ensuring durability and reliability during wafer processing.ドキュメント
ドキュメントなし