説明
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: N2 ANNEAL Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 200V Main/APC: EC-5000 Gas: N2構成
Process: N2 ANNEAL The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEMモデルの説明
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.ドキュメント
ドキュメントなし
KOKUSAI-ELECTRIC (KE)
DD-802V
検証済み
カテゴリ
Furnaces / Diffusion
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
72844
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KOKUSAI-ELECTRIC (KE)
DD-802V
カテゴリ
Furnaces / Diffusion
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
72844
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: N2 ANNEAL Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 200V Main/APC: EC-5000 Gas: N2構成
Process: N2 ANNEAL The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEMモデルの説明
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.ドキュメント
ドキュメントなし