説明
Purpose: Al2O3 ALD Film deposition -Monolayer Al2O3 or TiO2 deposition -Thermal chemical reaction for deposition. -Batch type process. ~Å to 10nm is the typical process. -300oC is the typical setting for deposition.構成
Chemicals: TMA, TiCl4 Process type: Batch type process Pumping system: -Ebrara M802N-BE*2, -Ebrara EV-S20P*2 (1 set for service, 1 set for spare) Local Scrubber: Kanken Techno KT1000MFH Foundation: 1* Standalone typeOEMモデルの説明
"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."ドキュメント
ドキュメントなし
カテゴリ
Furnaces / Diffusion
最終検証： 2日前
主なアイテムの詳細
状態：
New
稼働ステータス:
不明
製品ID：
147938
ウェーハサイズ：
不明
ヴィンテージ：
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KOKUSAI-ELECTRIC (KE)
DJ 853V
カテゴリ
Furnaces / Diffusion
最終検証： 2日前
主なアイテムの詳細
状態：
New
稼働ステータス:
不明
製品ID：
147938
ウェーハサイズ：
不明
ヴィンテージ：
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Purpose: Al2O3 ALD Film deposition -Monolayer Al2O3 or TiO2 deposition -Thermal chemical reaction for deposition. -Batch type process. ~Å to 10nm is the typical process. -300oC is the typical setting for deposition.構成
Chemicals: TMA, TiCl4 Process type: Batch type process Pumping system: -Ebrara M802N-BE*2, -Ebrara EV-S20P*2 (1 set for service, 1 set for spare) Local Scrubber: Kanken Techno KT1000MFH Foundation: 1* Standalone typeOEMモデルの説明
"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."ドキュメント
ドキュメントなし