説明
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)構成
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEMモデルの説明
提供なしドキュメント
ドキュメントなし
MRL
Cyclone 630
検証済み
カテゴリ
Furnaces / Diffusion
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111178
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MRL
Cyclone 630
カテゴリ
Furnaces / Diffusion
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111178
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)構成
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEMモデルの説明
提供なしドキュメント
ドキュメントなし